Top 10 Companies in the EUV Lithography Pellicle Market (2026): Market Leaders Powering Global Innovation

MARKET INSIGHTS

Global EUV Lithography Pellicle market was valued at USD 72 million in 2025 to USD 163 million by 2034, exhibiting a 9.3% CAGR during the forecast period.

EUV Lithography Pellicles are ultra‑thin protective films that shield photomasks from contamination during extreme ultraviolet (EUV) lithography processes. They preserve yield by preventing particle‑induced defects on wafers, a critical requirement as chip geometries shrink below 7 nm. The shift from single‑layer polysilicon structures to advanced multi‑layer designs incorporating molybdenum disilicide (MoSi) and silicon (Si) has lifted EUV light transmittance from 82 % to roughly 90 %.

Market expansion is driven by the semiconductor industry’s move to sub‑7 nm EUV lithography for AI and high‑performance computing, coupled with material breakthroughs such as carbon nanotube (CNT) pellicles. Mitsui Chemicals launched mass production in 2021 under an ASML license, while S&S Tech delivers solutions exceeding 90 % transmittance. As EUV power levels rise beyond 500 W, pellicle performance demands grow, presenting both opportunities and technical challenges for manufacturers.

EUV Lithography Pellicle Market – View in Detailed Research Report

🔟 1. Mitsui Chemicals, Inc.

Headquarters: Tokyo, Japan
Key Offering: Multi‑layer MoSi/Si pellicles with 90 % transmittance

Mitsui Chemicals pioneered the commercial production of EUV pellicles in 2021, leveraging an exclusive technology license from ASML. Their proprietary multi‑layer architecture delivers superior light transmission while withstanding the high thermal loads of next‑generation EUV tools. The company’s investment in a new CNT production facility slated for 2025 positions it to capture a growing share of the high‑NA EUV market.

Sustainability Initiatives:

• Reducing energy consumption in thin‑film deposition processes by 15 %.
• Implementing closed‑loop material recycling for molybdenum compounds.
• Partnering with ASML to develop low‑emission EUV source technologies.

🗹 2. S&S Tech

Headquarters: Seoul, South Korea
Key Offering: 90 %+ transmittance pellicles for high‑power EUV systems

S&S Tech’s advanced multi‑layer pellicles have become the standard in South Korean foundries, delivering consistent performance across a range of EUV power levels. Their rapid R&D cycle, from concept to production in under three years, enables swift responses to evolving industry demands.

Sustainability Initiatives:

• Adopting green chemistry processes for silicon deposition.
• Reducing particulate generation through in‑line monitoring.
• Investing in renewable energy for manufacturing facilities.

🗹 3. Canatu Oy

Headquarters: Espoo, Finland
Key Offering: CNT‑based pellicles with >94 % transmittance

Canatu is at the forefront of CNT pellicle technology, offering films that combine exceptional thermal stability with high light transmission. Their collaboration with Imec accelerates the transition from laboratory to commercial production.

Sustainability Initiatives:

• Using bio‑derived carbon sources for CNT synthesis.
• Optimizing deposition processes to minimize waste.
• Engaging in circular economy initiatives for silicon waste.

🗹 4. TSMC

Headquarters: Hsinchu, Taiwan
Key Offering: In‑house pellicle development for 3 nm and 2 nm nodes

TSMC’s internal R&D program focuses on integrating pellicle performance with foundry process flows. Their vertical integration strategy reduces dependency on external suppliers and tightens control over yield‑critical parameters.

Sustainability Initiatives:

• Targeting 30 % reduction in water usage by 2030.
• Deploying energy‑efficient EUV tools to lower carbon footprint.
• Collaborating with suppliers to certify low‑impact materials.

🗹 5. ASML

Headquarters: Veldhoven, Netherlands
Key Offering: EUV system integration and pellicle technology licensing

ASML’s dominance in EUV lithography tooling positions it as the primary driver of pellicle demand. By licensing technology to partners such as Mitsui Chemicals, ASML extends its ecosystem while maintaining control over performance standards.

Sustainability Initiatives:

• Reducing CO₂ emissions in tool manufacturing by 20 %.
• Investing in high‑efficiency EUV light sources.
• Partnering with material suppliers to certify low‑toxicity processes.

🗹 6. FST

Headquarters: Shenzhen, China
Key Offering: Cost‑effective pellicles for emerging EUV fabs

FST supplies a broad portfolio of pellicles tailored to the rapidly expanding Chinese semiconductor market. Their focus on scalable manufacturing supports the country’s ambition to increase domestic EUV capacity.

Sustainability Initiatives:

• Implementing green energy solutions in production lines.
• Reducing hazardous waste through advanced filtration.
• Engaging in community outreach on responsible manufacturing.

🗹 7. Entegris

Headquarters: San Jose, USA
Key Offering: Cleanroom equipment and pellicle delivery solutions

Entegris supplies critical infrastructure for pellicle production, ensuring Class 1 cleanroom conditions and precise thin‑film deposition. Their integrated supply chain mitigates material bottlenecks and supports consistent quality.

Sustainability Initiatives:

• Adopting zero‑waste manufacturing practices.
• Optimizing water usage in cleanroom operations.
• Collaborating with customers to reduce overall carbon footprint.

🗹 8. GlobalFoundries

Headquarters: Santa Clara, USA
Key Offering: Advanced pellicles for 14 nm and below nodes

GlobalFoundries leverages its expertise in advanced process nodes to deliver pellicles that meet the stringent defect tolerance required for high‑volume manufacturing.

Sustainability Initiatives:

• Implementing renewable energy in fabs.
• Reducing process chemicals through closed‑loop systems.
• Supporting local communities through STEM education programs.

🗹 9. Samsung Electronics

Headquarters: Suwon, South Korea
Key Offering: High‑yield pellicles for memory and logic fabs

Samsung’s pellicle solutions cater to both memory and logic processes, enabling consistent performance across diverse application portfolios.

Sustainability Initiatives:

• Targeting 70 % renewable energy usage by 2030.
• Reducing waste in semiconductor manufacturing.
• Investing in carbon‑neutral production technologies.

🗹 10. Intel Corporation

Headquarters: Santa Clara, USA
Key Offering: Integrated pellicle and lithography solutions for 7 nm and below

Intel’s end‑to‑end approach to pellicle development aligns with its focus on delivering high‑performance processors for AI and data‑center workloads.

Sustainability Initiatives:

• Reducing greenhouse gas emissions by 30 % by 2030.
• Investing in water‑efficient fabs.
• Promoting responsible sourcing of raw materials.

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🌍 Outlook: The Future of EUV Lithography Pellicle Market

As semiconductor manufacturers push toward sub‑2 nm nodes, the demand for pellicles that combine high transmittance with exceptional thermal stability will intensify. The transition to CNT‑based films, coupled with multi‑layer MoSi/Si architectures, is expected to unlock new performance thresholds. Supply chain resilience will also shape the market, with diversified material sourcing and strategic partnerships becoming critical to sustain production volumes.

📈 Key Trends Shaping the Market:

• Adoption of CNT pellicles for high‑NA EUV systems.
• Expansion of EUV lithography beyond advanced logic into memory and mature nodes.
• Increasing power output of EUV tools, necessitating pellicles that withstand higher thermal loads.
• Strategic collaborations between material scientists, equipment manufacturers, and foundries to accelerate innovation.
• Focus on sustainability across the pellicle supply chain, from raw material sourcing to end‑of‑life recycling.