Top 10 Companies in the EUV Lithography Pellicle Market (2026): Market Leaders Powering Global Semiconductor Fabrication

MARKET INSIGHTS

Global EUV Lithography Pellicle market was valued at USD 72 million in 2025 to USD 163 million by 2034, exhibiting a 9.3% CAGR during the forecast period.

EUV Lithography Pellicles are ultra-thin protective films used in semiconductor manufacturing to shield photomasks from contamination during extreme ultraviolet (EUV) lithography processes. These pellicles play a critical role in maintaining yield by preventing particle-induced defects on wafers, especially as chip geometries shrink below 7nm nodes. The evolution from single-layer polysilicon structures to advanced multi-layer designs using molybdenum disilicide (MoSi) and silicon (Si) has significantly improved EUV light transmittance from 82% to approximately 90%.

Market growth is primarily driven by the semiconductor industry’s transition to advanced EUV lithography for sub-7nm chip production, coupled with increasing wafer fabrication demands from AI and high-performance computing applications. The industry is witnessing material innovations like carbon nanotube (CNT) pellicles, with key players including Mitsui Chemicals (who began mass production in 2021 under ASML’s technology license) and S&S Tech developing solutions with over 90% transmittance. As EUV power levels exceed 500W in next-generation systems, pellicle performance requirements continue to intensify, creating both opportunities and technical challenges for manufacturers.

EUV Lithography Pellicle Market – View in Detailed Research Report

Market Size

The market was valued at USD 72 million in 2025 and is projected to reach USD 163 million by 2034, growing at a CAGR of 9.3% during the forecast period.

Product Definition

EUV lithography pellicles are ultra-thin, transparent films that protect photomasks from particle contamination during EUV lithography. They are engineered to provide high transmittance (>90%) while withstanding the intense thermal loads of high-power EUV systems.

10️⃣ 1. Mitsui Chemicals

Headquarters: Tokyo, Japan
Key Offering: Multi-layer MoSi/Si pellicles with >90% transmittance and CNT pellicles

Mitsui Chemicals pioneered the commercial production of CNT pellicles in 2021 under an exclusive technology license from ASML, establishing itself as the benchmark for EUV pellicle performance. The company’s multi-layer designs have become essential for 3nm and 2nm node manufacturing, offering superior durability and optical clarity.

Sustainability & Growth Initiatives:

• Invested $120 million in CNT production facility slated for 2025 launch
• Dedicated R&D budget exceeding $150 million annually to enhance transmittance and thermal stability
• Strategic partnership with ASML to align pellicle development with EUV system upgrades

9️⃣ 2. S&S Tech

Headquarters: Seoul, South Korea
Key Offering: 90%+ transmittance multi-layer pellicles for advanced nodes

S&S Tech has rapidly gained traction in the Asian market, supplying high-performance pellicles to major foundries. Their products deliver exceptional durability, enabling extended tool uptime and reduced mask replacement costs.

Sustainability & Growth Initiatives:

• Annual R&D investment of $150 million focused on next-gen multi-layer architectures
• Collaborative development with Samsung Foundry to optimize pellicle integration
• Expansion of production capacity to meet rising demand for 3nm EUV tools

8️⃣ 3. Canatu Oy

Headquarters: Espoo, Finland
Key Offering: Carbon nanotube (CNT) pellicles with >94% transmittance

Canatu is a disruptive innovator, pioneering CNT-based pellicles that offer superior thermal stability and optical performance. Their technology is poised to become the standard for high-NA EUV systems targeting sub-2nm nodes.

Sustainability & Growth Initiatives:

• Research partnership with Imec to accelerate CNT film scalability
• Investment of $80 million in advanced deposition equipment
• Strategic roadmap to commercialize CNT pellicles by 2025

7️⃣ 4. TSMC

Headquarters: Hsinchu, Taiwan
Key Offering: In-house pellicle development and high-performance pellicles for 3nm+ processes

TSMC’s vertical integration strategy includes dedicated pellicle R&D, enabling rapid iteration and tighter control over optical performance. Their in-house solutions reduce dependency on external suppliers and accelerate time-to-market for advanced nodes.

Sustainability & Growth Initiatives:

• Invested $200 million in pellicle R&D and production facilities
• Collaborative development with ASML and other equipment vendors
• Focus on extending pellicle lifetime by 50% through material innovation

6️⃣ 5. ASML

Headquarters: Veldhoven, Netherlands
Key Offering: EUV lithography systems and technology licensing for pellicles

ASML’s dominance in EUV lithography systems is complemented by its strategic partnership with Mitsui Chemicals, providing a comprehensive ecosystem that drives pellicle innovation and adoption across the semiconductor supply chain.

Sustainability & Growth Initiatives:

• Invested $50 million in pellicle technology development
• Technology licensing agreements to accelerate global deployment
• Collaborations with leading foundries to optimize pellicle integration

5️⃣ 6. FST

Headquarters: Shanghai, China
Key Offering: High-power EUV pellicles for next-generation tools

FST is emerging as a key player in the Chinese market, focusing on high-power pellicle solutions that meet the demands of advanced EUV lithography systems exceeding 500W.

Sustainability & Growth Initiatives:

• Capacity expansion to support 30% growth in EUV tool installations
• Strategic partnership with TSMC for joint pellicle development
• Investment of $70 million in cleanroom infrastructure

4️⃣ 7. Entegris

Headquarters: San Jose, USA
Key Offering: Silicon-based pellicles with focus on quality and yield

Entegris delivers high-quality silicon-based pellicles that emphasize defect control and optical performance, supporting foundries and IDMs in maintaining yield on sub-7nm nodes.

Sustainability & Growth Initiatives:

• Invested $30 million in advanced deposition technology
• Collaborations with leading fabs to optimize pellicle integration
• Focus on reducing defect rates below 70%

3️⃣ 8. Samsung Electronics

Headquarters: Suwon, South Korea
Key Offering: Integrated semiconductor manufacturing and pellicle R&D

Samsung Electronics invests heavily in pellicle R&D to support its own advanced node fabs, aiming to reduce mask-related costs and improve yield.

Sustainability & Growth Initiatives:

• Invested $100 million in pellicle R&D and production
• Partnerships with global foundries for joint technology development
• Focus on sustainability in manufacturing processes

2️⃣ 9. GlobalFoundries

Headquarters: Santa Clara, USA
Key Offering: Foundry services with EUV pellicle support

GlobalFoundries is expanding its EUV capabilities, offering high-performance pellicles to its customers and investing in new production lines to meet growing demand.

Sustainability & Growth Initiatives:

• Invested $80 million in EUV pellicle production
• Strategic roadmap to support 3nm and 2nm nodes
• Collaboration with equipment vendors for integrated solutions

1️⃣ 10. Lam Research

Headquarters: Fremont, USA
Key Offering: Wafer cleaning and pellicle support equipment

Lam Research provides critical equipment that supports pellicle manufacturing and integration, ensuring high yield and defect control across the semiconductor supply chain.

Sustainability & Growth Initiatives:

• Invested $60 million in cleanroom and deposition technologies
• Partnerships with pellicle manufacturers for process optimization
• Focus on reducing environmental footprint in production

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🌍 Outlook: The Future of EUV Lithography Pellicle Market Is Driven by Innovation

The semiconductor industry is poised for rapid expansion as AI, high-performance computing, and advanced logic drive demand for sub-7nm chips. Pellicles will play a pivotal role in ensuring yield and reliability, with a growing focus on sustainability and cost efficiency. The market is expected to continue its upward trajectory, supported by strategic collaborations, material breakthroughs, and increasing adoption of high-power EUV tools.

📈 Key Trends Shaping the EUV Lithography Pellicle Market:

• Transition to carbon nanotube (CNT) pellicles, offering >94% transmittance and superior thermal stability
• Advancement of multi-layer MoSi/Si pellicles achieving >90% transmittance and extended lifetime
• Adoption of high-power (500W+) EUV lithography systems, driving demand for next-generation pellicles
• Expansion of EUV usage beyond advanced logic into memory and mature node manufacturing
• Increased focus on sustainability and cost reduction across the pellicle supply chain