The Global Non Chemically Amplified EUV Resist Market was valued at US$ 284.7 Million in 2023 and is projected to reach US$ 621.4 Million by 2030, growing at a Compound Annual Growth Rate (CAGR) of 11.8% during the forecast period (2024–2030). This robust growth is fueled by the relentless drive toward semiconductor miniaturization, the global expansion of EUV lithography infrastructure, and the escalating demand for high-performance computing and AI chips.

As the semiconductor industry pushes beyond the 5nm node, the critical role of Non-Chemically Amplified (Non-CAR) EUV resists in achieving high-resolution patterning with low line-edge roughness comes into sharp focus. These advanced materials are pivotal for defining the intricate features of tomorrow’s most powerful chips. In this analysis, we profile the Top 10 Companies in the Non Chemically Amplified EUV Resist Industry—a group of chemical giants, specialized material suppliers, and innovators shaping the foundational layer of advanced semiconductor manufacturing.

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🔟 1. JSR Corporation (including Inpria)

Headquarters: Tokyo, Japan
Key Offering: Metal Oxide Resist (MOR) platforms

JSR Corporation, following its strategic acquisition of Inpria, is a dominant force in the Non-CAR EUV resist landscape. Inpria’s pioneering work in metal-oxide-based photoresists, particularly tin-oxo clusters, offers high sensitivity and excellent etch resistance, making them a preferred choice for leading-edge logic and memory applications at nodes below 7nm.

Innovation & Development Initiatives:

• World-leading Metal Oxide Resist (MOR) technology portfolio

• Continuous R&D to improve sensitivity and reduce stochastic defects

• Deep collaborations with global semiconductor manufacturers and equipment suppliers

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9️⃣ 2. Lam Research

Headquarters: Fremont, California, USA
Key Offering: Dry resist solutions and deposition systems

While primarily an equipment vendor, Lam Research has made significant strides in materials science, particularly with its dry photoresist technology. This approach involves depositing the resist film from the vapor phase, which can offer advantages in uniformity and defect control for EUV patterning, positioning Lam as a key innovator in the materials-enabled patterning ecosystem.

Innovation & Development Initiatives:

• Development of vapor-deposited dry resist processes

• Integration of resist materials with its market-leading etch and deposition systems

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8️⃣ 3. DuPont de Nemours, Inc.

Headquarters: Wilmington, Delaware, USA
Key Offering: Cymer light sources, advanced patterning films

DuPont, through its ownership of Cymer (a leading source of EUV light sources), and its legacy in electronic materials, is deeply embedded in the EUV ecosystem. The company develops advanced materials that support the EUV patterning process, including underlayers and topcoats that are critical for the performance of Non-CAR resists, ensuring optimal imaging and defect minimization.

Innovation & Development Initiatives:

• Development of synergistic materials for EUV patterning stacks

• R&D focused on improving photon efficiency and process control

Download FREE Sample Report: Non Chemically Amplified EUV Resist Market – View in Detailed Research Report

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7️⃣ 4. Shin-Etsu Chemical Co., Ltd.

Headquarters: Tokyo, Japan
Key Offering: High-purity semiconductor materials, EUV resist R&D

Shin-Etsu Chemical is a global leader in semiconductor silicon wafers and a major supplier of photoresists for all lithography segments. The company maintains active and significant R&D programs focused on next-generation EUV resists, leveraging its extensive expertise in ultra-pure chemical synthesis to develop novel Non-CAR formulations aimed at meeting the stringent requirements of future technology nodes.

Innovation & Development Initiatives:

• Sustained investment in advanced EUV resist research

• Leveraging core competencies in high-purity chemistry for material development

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6️⃣ 5. Fujifilm Holdings Corporation

Headquarters: Tokyo, Japan
Key Offering: Electronic materials, EUV resist platforms

Fujifilm is another Japanese chemical giant with a strong electronic materials division. The company is actively developing its own EUV photoresist platforms, investing in the creation of both chemically amplified and non-chemically amplified resist systems to cater to the diverse needs of the semiconductor industry as it adopts High-NA EUV lithography.

Innovation & Development Initiatives:

• Proprietary polymer and molecular design for EUV resists

• Focus on improving resolution, sensitivity, and defect performance

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5️⃣ 6. Tokyo Ohka Kogyo Co., Ltd. (TOK)

Headquarters: Kawasaki, Japan
Key Offering: Full suite of photoresists and process chemicals

TOK is a cornerstone of the semiconductor materials supply chain, providing a comprehensive range of photoresists. The company has dedicated research facilities and partnerships aimed at advancing EUV lithography materials. TOK’s development efforts include next-generation Non-CAR resists designed to address the fundamental challenges of stochastic effects and line-edge roughness at atomic-scale dimensions.

Innovation & Development Initiatives:

• Comprehensive R&D programs for EUV material solutions

• Close collaboration with chipmakers to tailor resist performance

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4️⃣ 7. Merck KGaA (EMD Performance Materials)

Headquarters: Darmstadt, Germany
Key Offering: Electronics materials, deposition precursors

Merck KGaA, through its EMD Electronics business, is a key player in providing materials for semiconductor fabrication. While its strength lies in deposition materials and CMP slurries, the company’s broad expertise in high-purity chemicals for the electronics industry positions it as a potential entrant and innovator in the advanced EUV photoresist space, including exploration of novel Non-CAR systems.

Innovation & Development Initiatives:

• Exploration of new material platforms for advanced patterning

• Investment in global R&D centers focused on semiconductor materials

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3️⃣ 8. ALLRESIST GmbH

Headquarters: Strausberg, Germany
Key Offering: Specialty resists for R&D and prototyping

ALLRESIST specializes in supplying photoresists and ancillary chemicals for research institutions, universities, and pilot production lines. While not focused on high-volume manufacturing for leading-edge nodes, the company provides accessible EUV resist solutions for the R&D community, playing a crucial role in early-stage development and fundamental research on Non-CAR materials and processes.

Innovation & Development Initiatives:

• Providing materials for academic and industrial R&D in EUV lithography

• Supporting the development ecosystem for next-generation patterning technologies

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2️⃣ 9. KemLab Inc.

Headquarters: Woburn, Massachusetts, USA
Key Offering: Custom synthetic chemistry for electronic materials

KemLab is a specialized chemical company that provides custom synthesis and development services for the electronics industry. Its role in the Non-CAR EUV resist market is as an innovator and potential supplier of novel photoactive compounds, monomers, and polymers that form the basis of advanced resist formulations, serving both large material companies and research consortia.

Innovation & Development Initiatives:

• Development of novel molecular components for EUV resists

• Custom synthesis services to accelerate materials discovery

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1️⃣ 10. MicroChem (Kayaku Advanced Materials)

Headquarters: Westborough, Massachusetts, USA
Key Offering: SU-8 and other high-performance resists

MicroChem, part of Kayaku Advanced Materials, is renowned for its SU-8 epoxy-based photoresist, widely used in MEMS and high-aspect-ratio patterning. The company’s expertise in formulating resists for demanding applications provides a foundation for exploring specialized Non-CAR solutions tailored for specific EUV applications beyond mainstream logic and memory, such as photonics and advanced packaging.

Innovation & Development Initiatives:

• Leveraging expertise in high-performance resist chemistry

• Exploring niche applications for EUV lithography

Get Full Report Here: Non Chemically Amplified EUV Resist Market – View in Detailed Research Report

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🌍 Outlook: The Future of EUV Patterning Is Driven by Material Innovation

The Non-Chemically Amplified EUV Resist market is at the heart of the semiconductor industry’s roadmap. As feature sizes shrink to near-atomic dimensions, the performance of the photoresist becomes the limiting factor in achieving yield and performance targets. The transition to High-NA EUV tools further amplifies the need for resist materials with unprecedented resolution and sensitivity.

📈 Key Trends Shaping the Market:

• Accelerated adoption of Metal Oxide Resists (MOR) for their superior etch resistance and sensitivity

• Intense R&D focus on mitigating stochastic effects—random variations that cause defects at extremely small pitches

• The emergence of dry film resists and other novel application methods to improve film uniformity and defectivity

• Growing collaboration between material suppliers, equipment manufacturers (ASML, Lam, TEL), and chipmakers (Intel, TSMC, Samsung) to co-optimize the entire patterning process

Get Full Report Here: Non Chemically Amplified EUV Resist Market – View in Detailed Research Report

The companies profiled here are not just supplying chemicals; they are enabling the next wave of computational power and technological advancement by providing the foundational materials that make advanced semiconductor manufacturing possible.