The Global Post Etch Residue (PER) Cleaning Solutions Market was valued at an estimated USD 620 Million in 2024 and is projected to reach USD 855 Million by 2030, growing at a Compound Annual Growth Rate (CAGR) of 5.5% during the forecast period (2024–2030). This robust growth is fueled by the relentless miniaturization of semiconductor nodes, the global expansion of semiconductor fabrication facilities (fabs), and the escalating demand for advanced cleaning chemistries tailored for complex 3D structures like FinFETs and GAA transistors.

As the semiconductor industry pushes the boundaries of physics, the removal of post-etch residues without damaging delicate nanoscale features has become a critical manufacturing step. The quality and efficacy of PER cleaning solutions directly impact chip yields, performance, and reliability. In this blog, we profile the Top 10 Companies in the Post Etch Residue (PER) Cleaning Solutions Market—specialty chemical giants and technology pioneers ensuring the integrity of next-generation electronics.

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🔟 1. Entegris

Headquarters: Billerica, Massachusetts, USA
Key Offering: EKC® PER Cleaning Chemistry, Photoresist Strippers, Formulations for Advanced Nodes

Entegris is a global leader in microcontamination control, providing high-purity materials and process solutions for the semiconductor industry. Its EKC technology division offers a comprehensive portfolio of PER cleaning chemistries designed for high selectivity and low damage, essential for sub-10nm processes.

Key Innovations & Market Focus:

• Development of ultra-selective chemistries for EUV lithography and high-aspect-ratio structures.

• Integration of cleaning solutions with its purification and fluid handling systems for total process control.

• Strategic focus on sustainability with lower environmental impact formulations.

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9️⃣ 2. DuPont

Headquarters: Wilmington, Delaware, USA
Key Offering: DuPont™ EKC PER Removers, DuPont™ TMAH-based Strippers

DuPont’s Electronics & Industrial segment is a cornerstone of the semiconductor materials market. The company’s PER cleaning solutions are renowned for their effectiveness in removing complex polymer residues from various dielectric and metal etch processes, supporting both legacy and leading-edge manufacturing.

Key Innovations & Market Focus:

• Advanced solvent-based formulations for challenging residues from low-k dielectric and metal etch.

• Strong R&D pipeline focused on materials for 3D NAND and logic devices below 5nm.

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8️⃣ 3. Versum Materials, Inc. (Merck KGaA)

Headquarters: Tempe, Arizona, USA (Part of Merck KGaA’s Electronics business)
Key Offering: Cee® and AquaCee® PER Removers, Post-CMP Cleaners

Versum Materials, now fully integrated into Merck KGaA’s Electronics business unit, is a premier supplier of high-purity process chemicals. The Cee® product line is a benchmark in the industry for removing residues from metal and dielectric etch processes with high selectivity to critical materials.

Key Innovations & Market Focus:

• Leading supplier of fluorine-based chemistries for residue removal on cobalt and copper interconnects.

• Global manufacturing and R&D footprint aligned with major semiconductor clusters in Asia, the US, and Europe.

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7️⃣ 4. Mitsubishi Gas Chemical

Headquarters: Tokyo, Japan
Key Offering: MCL® Series PER Removers, High-Purity Chemicals

Mitsubishi Gas Chemical is a key Japanese player in the electronic materials space. The company’s MCL® series of cleaning agents are widely used for removing residues from plasma etching processes, particularly in the manufacture of memory and advanced logic devices.

Key Innovations & Market Focus:

• Strong market penetration in Asia-Pacific, serving leading foundries and memory manufacturers.

• Focus on developing water-based and semi-aqueous removers with enhanced environmental profiles.

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6️⃣ 5. Fujifilm

Headquarters: Tokyo, Japan
Key Offering: Fujifilm Planarel™ Cleaning Solutions, Etch Residue Removers

Fujifilm’s Electronic Materials business leverages its deep expertise in chemical synthesis to produce advanced cleaning solutions for semiconductor fabrication. Its products are designed to address the unique challenges posed by new materials introduced at advanced technology nodes.

Key Innovations & Market Focus:

• Innovation in formulations compatible with ultra-thin films and sensitive EUV photoresists.

• Expansion of its electronic materials portfolio through strategic R&D and partnerships.

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5️⃣ 6. Avantor

Headquarters: Radnor, Pennsylvania, USA
Key Offering: J.T.Baker® PER Cleaning Chemicals, High-Purity Solvents

Avantor is a leading global provider of mission-critical products and services to customers in the life sciences and advanced technology industries. Its J.T.Baker® brand offers a range of high-purity acids, solvents, and specialty cleaners used in PER removal processes.

Key Innovations & Market Focus:

• Broad portfolio of ultra-high-purity chemicals supporting a wide range of semiconductor manufacturing steps.

• Strong supply chain and logistics network ensuring reliable delivery to fabs worldwide.

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4️⃣ 7. Solexir

Headquarters: Suwon-si, Gyeonggi-do, South Korea
Key Offering: Specialty PER Removers, Custom Formulations

Solexir is a specialized South Korean company focused on developing and manufacturing high-purity chemicals for the semiconductor and display industries. The company provides tailored PER cleaning solutions, often collaborating closely with chipmakers to solve specific process challenges.

Key Innovations & Market Focus:

• Agile development of custom formulations for leading Korean memory and foundry giants.

• Focus on cost-effective solutions without compromising on performance and purity.

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3️⃣ 8. Technic Inc.

Headquarters: Providence, Rhode Island, USA
Key Offering: Electra® Clean PER Formulations, Electroplating and Cleaning Chemistry

Technic Inc. is a diversified supplier of equipment, chemicals, and services for the printed circuit board and semiconductor industries. Its chemical division provides effective PER cleaning solutions that complement its broader portfolio of surface finishing products.

Key Innovations & Market Focus:

• Integration of cleaning chemistry expertise with its precision plating and surface treatment technologies.

• Serving a broad customer base from advanced packaging and interposer manufacturing.

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2️⃣ 9. KMG Chemicals (Cabot Microelectronics)

Headquarters: Philadelphia, Pennsylvania, USA (Part of Cabot Microelectronics)
Key Offering: High-Purity Process Chemicals, CMP Slurries & Post-CMP Cleaners

KMG Chemicals, now part of Cabot Microelectronics, has a strong heritage in high-purity process chemicals used in semiconductor manufacturing. While renowned for its CMP slurries, the company also supplies cleaning chemistries that are critical for post-etch and post-CMP residue removal.

Key Innovations & Market Focus:

• Leveraging synergies between CMP and cleaning technologies for integrated process solutions.

• Focus on developing solutions for new materials like ruthenium and cobalt used in interconnects.

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1️⃣ 10. BASF SE

Headquarters: Ludwigshafen, Germany
Key Offering: Irgasol® PER Removers, Specialty Intermediates for Electronics

BASF, a global chemical giant, offers a range of specialty chemicals for the electronics industry through its Intermediates division. Its Irgasol® products are used for effective photoresist stripping and post-etch residue cleaning, backed by the company’s vast R&D capabilities.

Key Innovations & Market Focus:

• Commitment to sustainability, developing “green chemistries” with reduced environmental, health, and safety impacts.

• Strong global presence and technical support network for major semiconductor manufacturers.

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🔬 Outlook: The Future of PER Cleaning is Precision and Sustainability

The PER cleaning solutions market is entering a phase of intense innovation. As semiconductor device architectures become increasingly three-dimensional and incorporate novel materials, cleaning processes must achieve near-atomic-level precision without introducing defects.

📈 Key Trends Shaping the Market:

• Transition towards water-based and semi-aqueous removers to meet stringent environmental regulations and reduce fab chemical usage.

• Development of supercritical CO2 cleaning and other dry cleaning technologies for ultra-sensitive structures.

• Rising importance of formulation selectivity for new interconnect metals like ruthenium and barrier layers.

• Increased collaboration between chemical suppliers and equipment OEMs to develop integrated cleaning modules.

The companies profiled above are not just supplying chemicals; they are providing the essential enabling technologies that allow the continued scaling of Moore’s Law and the advancement of the global digital economy.

Get Full Report Here: Post Etch Residue (PER) Cleaning Solutions Market – View in Detailed Research Report